Chemicals for Chemical Mechanical Polishing (CMP)

Polysciences offers several unique surfactants/particle suspension aids for using in CMP.

Poly(acrylic acid), Nom. MW 5,000, Electronics Grade
Poly(acrylic acid), Nom. MW 10,000, Electronics Grade
Poly(acrylic acid), Nom. MW 15,000, Electronics Grade
Poly(acrylic acid), Nom. MW 30,000, Electronics Grade
Poly(acrylic acid), Nom. MW 50,000, Electronics Grade

For additional information, please contact us at 1-800-523-2575 or 1-215-343-6484 or
email: info@polysciences.com

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  1. Nonyl Phenol

    Nonyl Phenol

    开始于: NT$2,234.00

    Nonyl phenol is a widely used material. It is useful as a starting point material in the synthesis of surfactants, pesticides, and detergents. It is also useful as an epoxy resin hardener and flexibilizer.

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